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E-BEAM PROCESS CHEMISTRIES

Cyantek offers high purity solvents and solvent blends for the E-Beam processes. The following is a list of the developer and rinse products for the PBS and ZEP-7000 resists:

I. PBS Developers:
Product % MIAK % MPK
DP-12 100 --------
DP-13 80 20
DP-14 70 30

I. PBS Rinses:
Product % IPA % Hexanol % MIAK
RP-10 60 -------- 40
RP-33 -------- 60 40

III. Developers & Rinses for the ZEP-7000 Resist:
Product Application Method
DP- 50 Developer Spray
DP- 60 Developer Puddle
RP- 21 Rinse Spray or Puddle

In addition to the above products, we welcome product inquiries for other positive and negative e-beam resists.

Nano-Strip and Nano-Strip 2X are registered trademarks of CYANTEK CORPORATION.
Copyright: September 2000